{"id":990,"date":"2021-02-23T11:08:14","date_gmt":"2021-02-23T16:08:14","guid":{"rendered":"https:\/\/demo.irdq.ca\/produit\/atomic-force-microscopy-afm-xe-150\/"},"modified":"2021-04-13T16:06:55","modified_gmt":"2021-04-13T20:06:55","slug":"atomic-force-microscopy-afm-xe-150","status":"publish","type":"product","link":"https:\/\/demo.irdq.ca\/en\/equipements\/atomic-force-microscopy-afm-xe-150\/","title":{"rendered":"Atomic Force Microscopy (afm) (XE-150)"},"content":{"rendered":"

Additional information<\/h2>\n\n\n\n\n
MANUFACTURER<\/th>\nPark Systems<\/td>\n<\/tr>\n
MODEL<\/th>\nXE-150<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Samples<\/h3>\n
    \n
  • Samples sizes: Samples size: 150 mm (6 in) maximum<\/li>\n
  • Thickness: 25 mm (1 kg) maximum<\/li>\n<\/ul>\n

    Analysis<\/h3>\n
      \n
    • Types : contact mode and non-contact mode<\/li>\n
    • Mainly used for non-destructive metrology on samples (etch and lithography) and characterization of thin films micro-roughness<\/li>\n<\/ul>\n

      Characteristics<\/h3>\n
        \n
      • Lateral resolution: 1.5 nm (closed-loop), 0.01 nm (open-loop)<\/li>\n
      • Mapping available<\/li>\n
      • XY scanning with closed-loop feedback control<\/li>\n
      • XY scan dimensions: 100 x 100 \u00b5m2<\/sup> \u2013 Vertical scan: 12 \u00b5m<\/li>\n
      • Z scan noise level: 0.05 nm (maximum)<\/li>\n
      • Motorized stage with maximum displacement of 225 \u00d7 150 mm (resolution: 0.5 \u00b5m)<\/li>\n
      • Programmable multiple points data acquisition<\/li>\n
      • CCD high resolution camera (Mpx) \u2013 maximum field of view 1680 x 1260 \u00b5m<\/li>\n
      • Anti-vibration table and acoustic chamber<\/li>\n
      • Very sharp tips for the metrology of high aspect ratio nanostructures<\/li>\n<\/ul>\n","protected":false},"excerpt":{"rendered":"

        Additional information MANUFACTURER Park Systems MODEL XE-150 Samples Samples sizes: Samples size: 150 mm (6 in) maximum Thickness: 25 mm (1 kg) maximum Analysis Types : contact mode and non-contact mode Mainly used for non-destructive metrology on samples (etch and lithography) and characterization of thin films micro-roughness Characteristics Lateral resolution: 1.5 nm (closed-loop), 0.01 nm […]<\/p>\n","protected":false},"featured_media":979,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_et_pb_use_builder":"","_et_pb_old_content":"","_et_gb_content_width":""},"product_cat":[358,365],"product_tag":[617],"yoast_head":"\nAtomic Force Microscopy (afm) (XE-150) | IRDQ<\/title>\n<meta name=\"robots\" content=\"noindex, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Atomic Force Microscopy (afm) (XE-150) | IRDQ\" \/>\n<meta property=\"og:description\" content=\"Additional information MANUFACTURER Park Systems MODEL XE-150 Samples Samples sizes: Samples size: 150 mm (6 in) maximum Thickness: 25 mm (1 kg) maximum Analysis Types : contact mode and non-contact mode Mainly used for non-destructive metrology on samples (etch and lithography) and characterization of thin films micro-roughness Characteristics Lateral resolution: 1.5 nm (closed-loop), 0.01 nm […]\" \/>\n<meta property=\"og:url\" content=\"https:\/\/demo.irdq.ca\/equipements\/microscopie-a-force-atomique-afm-xe-150\/\" \/>\n<meta property=\"og:site_name\" content=\"IRDQ\" \/>\n<meta property=\"article:modified_time\" content=\"2021-04-13T20:06:55+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-1.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"600\" \/>\n\t<meta property=\"og:image:height\" content=\"600\" \/>\n\t<meta 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