{"id":937,"date":"2021-02-23T11:08:23","date_gmt":"2021-02-23T16:08:23","guid":{"rendered":"https:\/\/demo.irdq.ca\/produit\/electron-beam-deposition\/"},"modified":"2021-04-13T16:06:47","modified_gmt":"2021-04-13T20:06:47","slug":"electron-beam-deposition","status":"publish","type":"product","link":"https:\/\/demo.irdq.ca\/en\/equipements\/electron-beam-deposition\/","title":{"rendered":"Electron Beam Deposition"},"content":{"rendered":"

Additional information<\/h2>\n\n\n\n\n
MANUFACTURER<\/th>\nKurt J. Lesker<\/td>\n<\/tr>\n
MODEL<\/th>\nAXXIS<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Samples<\/h3>\n
    \n
  • Samples size: maximum 152 mm (6 in.)<\/li>\n
  • Temperature\u00a0: ambient<\/li>\n
  • Wafer uniformity\u00a0: 5%<\/li>\n<\/ul>\n

    Characteristics<\/h3>\n
      \n
    • Source 1: Electron gun with 4 automatically selected crucibles<\/li>\n
    • Source 2: Sputtering with a 75 mm target and an AC source<\/li>\n
    • Source 3: Ion source for pre-cleaning or enhancing evaporation<\/li>\n
    • Rotation with angle variation from 0 to 180 degrees<\/li>\n
    • In-situ control of deposited films thickness<\/li>\n
    • Pressure: about 10-6<\/sup> Torr<\/li>\n
    • Sample holder cooled (~ 2 \u00b0C, no rotation)<\/li>\n
    • Non-normal incidence deposition; the sample holder can be oriented upward for sputtering, sideways for the ion source and downward for evaporation<\/li>\n<\/ul>\n

       <\/p>\n

      ROUTINE PROCESS<\/h3>\n

      Deposition<\/h4>\n
        \n
      • Available materials : Au, Al, Ti, Cu, Cr, Pt, Pd, SiO2<\/sub>, \u2026<\/li>\n
      • Thickness: from 10 nm to 1 \u00b5m (depending on film stress)<\/li>\n
      • Special characteristics : Noble metals are billed by the nn<\/li>\n<\/ul>\n","protected":false},"excerpt":{"rendered":"

        Additional information MANUFACTURER Kurt J. Lesker MODEL AXXIS Samples Samples size: maximum 152 mm (6 in.) Temperature\u00a0: ambient Wafer uniformity\u00a0: 5% Characteristics Source 1: Electron gun with 4 automatically selected crucibles Source 2: Sputtering with a 75 mm target and an AC source Source 3: Ion source for pre-cleaning or enhancing evaporation Rotation with angle […]<\/p>\n","protected":false},"featured_media":924,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_et_pb_use_builder":"","_et_pb_old_content":"","_et_gb_content_width":""},"product_cat":[386,387],"product_tag":[586],"yoast_head":"\nElectron Beam Deposition | IRDQ<\/title>\n<meta name=\"robots\" content=\"noindex, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Electron Beam Deposition | IRDQ\" \/>\n<meta property=\"og:description\" content=\"Additional information MANUFACTURER Kurt J. Lesker MODEL AXXIS Samples Samples size: maximum 152 mm (6 in.) Temperature\u00a0: ambient Wafer uniformity\u00a0: 5% Characteristics Source 1: Electron gun with 4 automatically selected crucibles Source 2: Sputtering with a 75 mm target and an AC source Source 3: Ion source for pre-cleaning or enhancing evaporation Rotation with angle […]\" \/>\n<meta property=\"og:url\" content=\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/\" \/>\n<meta property=\"og:site_name\" content=\"IRDQ\" \/>\n<meta property=\"article:modified_time\" content=\"2021-04-13T20:06:47+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-2.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"600\" \/>\n\t<meta property=\"og:image:height\" content=\"600\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data1\" content=\"1 minute\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/\",\"url\":\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/\",\"name\":\"Electron Beam Deposition | IRDQ\",\"isPartOf\":{\"@id\":\"https:\/\/demo.irdq.ca\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-2.jpg\",\"datePublished\":\"2021-02-23T16:08:23+00:00\",\"dateModified\":\"2021-04-13T20:06:47+00:00\",\"breadcrumb\":{\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/#breadcrumb\"},\"inLanguage\":\"en-US\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-US\",\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/#primaryimage\",\"url\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-2.jpg\",\"contentUrl\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-2.jpg\",\"width\":600,\"height\":600},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/canon-a-electron\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Accueil\",\"item\":\"https:\/\/demo.irdq.ca\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Equipment and processes available\",\"item\":\"https:\/\/demo.irdq.ca\/equipements\/\"},{\"@type\":\"ListItem\",\"position\":3,\"name\":\"Electron Beam Deposition\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/demo.irdq.ca\/#website\",\"url\":\"https:\/\/demo.irdq.ca\/\",\"name\":\"IRDQ\",\"description\":\"Infrastructure en recherche et d\u00e9veloppement du Qu\u00e9bec\",\"publisher\":{\"@id\":\"https:\/\/demo.irdq.ca\/#organization\"},\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/demo.irdq.ca\/?s={search_term_string}\"},\"query-input\":{\"@type\":\"PropertyValueSpecification\",\"valueRequired\":true,\"valueName\":\"search_term_string\"}}],\"inLanguage\":\"en-US\"},{\"@type\":\"Organization\",\"@id\":\"https:\/\/demo.irdq.ca\/#organization\",\"name\":\"IRDQ\",\"url\":\"https:\/\/demo.irdq.ca\/\",\"logo\":{\"@type\":\"ImageObject\",\"inLanguage\":\"en-US\",\"@id\":\"https:\/\/demo.irdq.ca\/#\/schema\/logo\/image\/\",\"url\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/irdq-logo-vertical.png\",\"contentUrl\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/irdq-logo-vertical.png\",\"width\":1705,\"height\":683,\"caption\":\"IRDQ\"},\"image\":{\"@id\":\"https:\/\/demo.irdq.ca\/#\/schema\/logo\/image\/\"}}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Electron Beam Deposition | IRDQ","robots":{"index":"noindex","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"og_locale":"en_US","og_type":"article","og_title":"Electron Beam Deposition | IRDQ","og_description":"Additional information MANUFACTURER Kurt J. 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