{"id":928,"date":"2021-02-23T11:08:24","date_gmt":"2021-02-23T16:08:24","guid":{"rendered":"https:\/\/demo.irdq.ca\/produit\/sputtering\/"},"modified":"2021-04-13T16:06:47","modified_gmt":"2021-04-13T20:06:47","slug":"sputtering","status":"publish","type":"product","link":"https:\/\/demo.irdq.ca\/en\/equipements\/sputtering\/","title":{"rendered":"Sputtering"},"content":{"rendered":"

Additional information<\/h2>\n\n\n\n\n
MANUFACTURER<\/th>\nKurt J. Lesker<\/td>\n<\/tr>\n
MODEL<\/th>\nCMS-18<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Samples<\/h3>\n
    \n
  • Sample size : maximum 152 mm (6 in.)<\/li>\n
  • Temperature : ambient to 850 \u00b0C<\/li>\n
  • Wafer uniformity : 5% on 152 mm<\/li>\n
  • Sample holder: rotation up to 20 rpm, polarization RF or DC<\/li>\n<\/ul>\n

    Characteristics<\/h3>\n
      \n
    • Source 1 and 2: 75 mm target with AC source<\/li>\n
    • Source 3: 75 mm target with DC source<\/li>\n
    • Source 4: strong magnet-enhanced cathode for magnetic materials<\/li>\n
    • Quick loading via loadlock<\/li>\n
    • Gas feed for reactive sputtering<\/li>\n
    • Recipes completely computer programmable<\/li>\n
    • Arcing elimination via pulsed DC sputtering<\/li>\n
    • Crystal-based thickness measurement<\/li>\n
    • Pressure: ~ 10-6<\/sup> Torr<\/li>\n<\/ul>\n

       <\/p>\n

      ROUTINE PROCESS<\/h3>\n

      Deposition via sputtering<\/h4>\n
        \n
      • Materials : Al, Ag, Cr, Cu, Mg, Au, Pd, Pt, Ti, W, Al2<\/sub>O3<\/sub>, SiO2<\/sub>, MgO, ITO, YBA2<\/sub>Cu3<\/sub>O7<\/sub>\u00a0\u00a0<\/li>\n
      • Thickness: from 10 nm to 1 \u00b5m (depending on film stress)<\/li>\n<\/ul>\n","protected":false},"excerpt":{"rendered":"

        Additional information MANUFACTURER Kurt J. Lesker MODEL CMS-18 Samples Sample size : maximum 152 mm (6 in.) Temperature : ambient to 850 \u00b0C Wafer uniformity : 5% on 152 mm Sample holder: rotation up to 20 rpm, polarization RF or DC Characteristics Source 1 and 2: 75 mm target with AC source Source 3: 75 […]<\/p>\n","protected":false},"featured_media":924,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_et_pb_use_builder":"","_et_pb_old_content":"","_et_gb_content_width":""},"product_cat":[386,387],"product_tag":[587],"yoast_head":"\nSputtering | IRDQ<\/title>\n<meta name=\"robots\" content=\"noindex, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Sputtering | IRDQ\" \/>\n<meta property=\"og:description\" content=\"Additional information MANUFACTURER Kurt J. Lesker MODEL CMS-18 Samples Sample size : maximum 152 mm (6 in.) Temperature : ambient to 850 \u00b0C Wafer uniformity : 5% on 152 mm Sample holder: rotation up to 20 rpm, polarization RF or DC Characteristics Source 1 and 2: 75 mm target with AC source Source 3: 75 […]\" \/>\n<meta property=\"og:url\" content=\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/\" \/>\n<meta property=\"og:site_name\" content=\"IRDQ\" \/>\n<meta property=\"article:modified_time\" content=\"2021-04-13T20:06:47+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-2.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"600\" \/>\n\t<meta property=\"og:image:height\" content=\"600\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data1\" content=\"1 minute\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/\",\"url\":\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/\",\"name\":\"Sputtering | IRDQ\",\"isPartOf\":{\"@id\":\"https:\/\/demo.irdq.ca\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-2.jpg\",\"datePublished\":\"2021-02-23T16:08:24+00:00\",\"dateModified\":\"2021-04-13T20:06:47+00:00\",\"breadcrumb\":{\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/#breadcrumb\"},\"inLanguage\":\"en-US\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-US\",\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/#primaryimage\",\"url\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-2.jpg\",\"contentUrl\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/icons-irdq-bg-2.jpg\",\"width\":600,\"height\":600},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/demo.irdq.ca\/equipements\/pulverisation\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Accueil\",\"item\":\"https:\/\/demo.irdq.ca\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Equipment and processes available\",\"item\":\"https:\/\/demo.irdq.ca\/equipements\/\"},{\"@type\":\"ListItem\",\"position\":3,\"name\":\"Sputtering\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/demo.irdq.ca\/#website\",\"url\":\"https:\/\/demo.irdq.ca\/\",\"name\":\"IRDQ\",\"description\":\"Infrastructure en recherche et d\u00e9veloppement du Qu\u00e9bec\",\"publisher\":{\"@id\":\"https:\/\/demo.irdq.ca\/#organization\"},\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/demo.irdq.ca\/?s={search_term_string}\"},\"query-input\":{\"@type\":\"PropertyValueSpecification\",\"valueRequired\":true,\"valueName\":\"search_term_string\"}}],\"inLanguage\":\"en-US\"},{\"@type\":\"Organization\",\"@id\":\"https:\/\/demo.irdq.ca\/#organization\",\"name\":\"IRDQ\",\"url\":\"https:\/\/demo.irdq.ca\/\",\"logo\":{\"@type\":\"ImageObject\",\"inLanguage\":\"en-US\",\"@id\":\"https:\/\/demo.irdq.ca\/#\/schema\/logo\/image\/\",\"url\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/irdq-logo-vertical.png\",\"contentUrl\":\"https:\/\/demo.irdq.ca\/wp-content\/uploads\/2021\/02\/irdq-logo-vertical.png\",\"width\":1705,\"height\":683,\"caption\":\"IRDQ\"},\"image\":{\"@id\":\"https:\/\/demo.irdq.ca\/#\/schema\/logo\/image\/\"}}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Sputtering | IRDQ","robots":{"index":"noindex","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"og_locale":"en_US","og_type":"article","og_title":"Sputtering | IRDQ","og_description":"Additional information MANUFACTURER Kurt J. 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