Atomic Force Microscopy (afm) (VT UHV STM/AFM)
Atomic Force Microscopy (afm) (VT UHV STM/AFM)
Additional information
| MANUFACTURER | Omicron Nanotechnology |
|---|---|
| MODEL | VT UHV STM/AFM |
Samples
- Samples size : 9×5 mm2 or 7 mm diameter maximum
- Thickness: 2 mm maximum
- Lateral resolution: atomic
Analysis
- Modes :
- STM : current feedback
- AFM: true non-contact mode (frequency feedback, system with quartz resonator and PLL to follow the resonance)
- Designed to work under UHV and produce images with atomic resolution for either operating modes (STM and AFM). The sample surface cleaning in performed in-situ via direct or indirect heating or by ion sputtering. The main advantage of this system is its ability to perform measurements within a wide range of temperatures, between 25 K and 1500 K.
Applications
- Surface-induced polymerization reactions
- Studies of surface processes
- Analysis of metals, semi-conductors and superconductors with atomic resolution
- Studies of surface phase change transitions
- Studies of inter-molecular interactions; self-assembly, self-organizing
Characteristics
- Measurement pressure: less than 3×10-11
- Measurement temperature : 25 K to 1500 K
- Maximum X and Y scanning dimensions: 12 µm, Z: 1.5 µm
- LEED – Auger Electronic Spectroscopy
- VACSCAN MKS Mass Spectrometer
- ISE 10 ion source (Argon, Hydrogen, Oxygen)
- System of gas injection for experiments regarding deposition and molecular growth on any substrate
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about the terms of use and availability, please complete the form below. After reviewing your request, we will get in touch with you promptly to offer the best available solution.