Dip-pen Nanolithography
Dip-pen Nanolithography
Additional information
| MANUFACTURER | NanoINK |
|---|---|
| MODEL | Nscriptor |
Equipment unique in Quebec, allowing AFM measurements:
- Samples sizes : 0.1 mm to 50 mm
- Maximum thickness : 38 mm
Characteristics
- The option <<Tip Bias Control>> allows Oxidation Nanolithography (process to be developed)
- Positioning precision: 10 nm
- Alignment precision: 150 nm
- Controlled temperature and humidity
PROCESS UNDER DEVELOPMENT
- Deposition of carbon nanotubes-based inks
- Minimum feature size: 30 nm
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To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about the terms of use and availability, please complete the form below. After reviewing your request, we will get in touch with you promptly to offer the best available solution.