Aligner (MJB3)
Aligner (MJB3)
Additional information
| MANUFACTURER | Karl Süss |
|---|---|
| MODEL | MJB3 |
Samples
- Photomasks sizes : 75 mm maximum
- Samples sizes : 10 mm to 50 mm
Characteristics
- Spectral selection : Near UV or far UV (wide spectrum)
ROUTINE PROCESS
Contact mode Photolithography
On : positive resists
- Minimum feature size : 1 µm
- Resist thickness : 0.5 µm to 2 µm
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To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about the terms of use and availability, please complete the form below. After reviewing your request, we will get in touch with you promptly to offer the best available solution.